| abstract |
The present invention creates interfaces that non-preferentially interact with different domains of the underlying block copolymer film by using vacuum deposited thin film materials. The non-preferential interface prevents the formation of a wetting layer and affects the domain orientation in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can function as a lithographic pattern. In one embodiment, the present invention is a layered structure comprising first, second and third layers on a surface, wherein the first layer comprises a surface energy neutralizing layer, and the second layer comprises It relates to a layered structure comprising a block copolymer film, wherein the third layer comprises parylene. |