| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2252-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D137-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04 |
| filingDate |
2013-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015516891-A |
| titleOfInvention |
Anhydrous copolymer topcoat for controlling the orientation of thin film block copolymers |
| abstract |
The present invention involves the use of a random copolymer topcoat that can be spin coated onto a block copolymer thin film and can be used to control the interfacial energy at the topcoat-block copolymer interface. The topcoat is soluble in aqueous weak bases, and once they are deposited on the block copolymer thin film, the surface energy can be altered. The use of self-assembled block copolymers to generate highly lithographic patterns depends on controlling their orientation in the thin film. The topcoat potentially allows easy control of the orientation of the block copolymer which is rather difficult otherwise. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020527860-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015159281-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017514671-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015199040-A |
| priorityDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |