http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015221926-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7081a5dffa69e148624a842390697ebf
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F10-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F10-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-38
filingDate 2014-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee1bc53fc5dfe54dd8d005f8db5c0ac1
publicationDate 2015-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2015221926-A
titleOfInvention Method for forming iron oxide film and iron oxide film
abstract An iron oxide capable of efficiently forming a triiron tetroxide film in a relatively short time while suppressing the formation of a diiron trioxide film as much as possible while maintaining the hardness of a base material (iron-based material or iron part). A method for forming a (triiron tetroxide) film and an iron oxide film formed using the method are provided. A method of forming an iron oxide film according to the present invention includes a base material (iron-based material) in a film forming chamber 3 in a vacuum film forming apparatus 1 having a film forming chamber 3 and a pressure gradient electron gun 4. Material or steel parts) 5 are installed. Thereafter, a negative bias voltage is applied to the base material (iron-based material or iron part) 5 and the plasma region 20 is generated in the film forming chamber 3 using the pressure gradient electron gun 4. By introducing oxygen gas into the film forming chamber 3, an iron oxide (Fe 3 O 4 ) film is formed on the surface of the substrate 5. [Selection] Figure 2
priorityDate 2014-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.