| abstract |
A lower layer material having antireflective properties and improved etch selectivity, particularly improved etch resistance to O2 and CF4 plasmas. A polymer-based reaction product of two monomers composed of a condensed ring compound having a functional group selected from OH, SH and OR3, and optionally a third monomer. [Effect] The polymer-based reaction product is useful as a lower layer in a semiconductor manufacturing process. [Selection figure] None |