http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015199840-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a22eaceb0b0bbbf7c44c050660478fd |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-722 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12e529afb2b93b940f4cd7747abeef6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e063c5c0d32b517cf333a7b9dd591fb3 |
| publicationDate | 2015-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015199840-A |
| titleOfInvention | Polishing composition |
| abstract | A polishing composition capable of producing a substrate having a high polishing rate and excellent surface roughness is provided. The polishing composition of the present invention comprises a permetallic acid, a fatty acid transition metal salt, a dispersion stabilizer, abrasive grains, and water. The permetallic acid is preferably a compound obtained by the action of a metal oxide having a redox potential of 0.7 volts or more and hydrogen peroxide. It is considered that the fatty acid transition metal salt promotes the decomposition of the permetallic acid, promotes the reaction between the permetallic acid and the surface to be polished, and acts as a catalyst. The dispersion stabilizer is a fatty acid transition metal by suspending and dispersing in a polishing composition a fatty acid transition metal salt that is insoluble in water and easily present in a floating state on the surface of the polishing composition. It is a substance showing the effect of increasing the efficiency of action such as a salt catalyst. For example, a silicon carbide substrate can be efficiently polished using the polishing composition of the present invention. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109280492-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109722673-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109722673-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021503170-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107299356-A |
| priorityDate | 2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.