http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015179820-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81a5d1f0d5dfdf51d2495345dd56dccc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B3-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B3-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B3-06 |
| filingDate | 2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90104314503d45d789213f5d114daf6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_564024c35ef2060b02ed1a140af669a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb94a03c1ab9d9519bfe1d5bb321c834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76bf0d7721543391764919b4a85e08ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c0cef882637bfd1d416cc95c6e9f54b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fa77f33d9960499a9a37134c29237c1 |
| publicationDate | 2015-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015179820-A |
| titleOfInvention | Substrate processing apparatus having a heater whose heating temperature can be adjusted according to the height of the process space |
| abstract | A substrate processing apparatus including a heater whose heating temperature can be adjusted according to the height of a process space. A substrate processing apparatus for performing a process on a substrate closes a lower chamber in which an upper part is opened and a passage through which the substrate enters and exits is formed on one side, and an opened upper part of the lower chamber, An external reaction tube that provides a process space in which a process is performed, and a substrate that can be switched between a stacking position in which one or more substrates are stacked in the vertical direction and a substrate is stacked therein and a process position in which a process is performed on the substrate A holder, an internal reaction tube disposed inside the external reaction tube and disposed at a peripheral portion of the substrate holder placed at the process position to define a reaction region for the substrate, and disposed inside the external reaction tube. The gas supply unit for supplying the reaction gas into the reaction zone and the external reaction tube are arranged so as to surround the reaction tube at different heights. And a plurality of heaters for heating between. [Selection] Figure 4 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017179431-A |
| priorityDate | 2014-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.