http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015175799-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26
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filingDate 2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7087502212ad225e215b2a61bcbad33e
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publicationDate 2015-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2015175799-A
titleOfInvention Semiconductor device evaluation method and semiconductor device evaluation apparatus
abstract A semiconductor device evaluation method and a semiconductor device evaluation device capable of accurately measuring a threshold voltage at turn-on are provided. A drain of a MOSFET, which is a device under test, is connected to a constant current source, and a source and a body are grounded. The constant voltage source 2 continues to apply a constant stress voltage Vg equal to or higher than the threshold voltage Vth of the MOSFET 1 to the gate of the MOSFET 1 at all times. The constant current source 3 supplies a source-drain current Isd between the source and drain of the MOSFET 1 and measures the source-drain voltage Vsd applied to the MOSFET 1 when the stress voltage Vg is applied to the MOSFET 1. And keep monitoring. The fluctuation amount ΔVth of the threshold voltage Vth of the MOSFET 1 can be obtained by converting the fluctuation amount of the source-drain voltage Vsd of the MOSFET 1 measured by the constant current source 3 into the fluctuation amount ΔVth of the threshold voltage Vth of the MOSFET 1. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102016216005-B4
priorityDate 2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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