| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C63-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C63-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C61-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b407ce24c25aac286c10a2e26b32a888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_926b08cd2f1681877250ba029f56b2fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_071aa39a2746bf7a509259cff1c77632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_234f320334f9a97fe9e39a3fe7148a86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22329e586f61a2d77b90fe124d0bcc05 |
| publicationDate |
2015-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015169790-A |
| titleOfInvention |
Chemically amplified positive resist composition and resist pattern forming method |
| abstract |
Disclosed is a chemically amplified positive resist composition that has a very high resolution and can provide a pattern with low line edge roughness. A chemically amplified positive resist composition containing (A) a salt represented by the formula (1) and (B) a resin containing a repeating unit represented by the formula (U-1). [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017203885-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015184456-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7363742-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020064305-A |
| priorityDate |
2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |