http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015151509-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ecc58e5fd0006c472fea1ec2f879638c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F297-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2014-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd59cd288a72069d82fbe0cb07ea332a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cc8ab225ae16288ed4a9b245018e5a5 |
| publicationDate | 2015-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015151509-A |
| titleOfInvention | Abrasives for chemical mechanical polishing |
| abstract | Provided is a chemical mechanical polishing abrasive capable of efficiently forming a highly reliable embedded pattern of a metal film by obtaining a high CMP rate while maintaining a low etching rate. A section (A) obtained by polymerizing a monomer (a) containing vinylpyrrolidone and a monomer (b) containing an ethylenically unsaturated monomer other than vinylpyrrolidone are polymerized. And a chemistry containing a copolymer formed by a living radical polymerization method having at least one section (B) and a step of forming the section (A) and a step of forming the section (B). A mechanical polishing abrasive is used. [Selection figure] None |
| priorityDate | 2014-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 354.