| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8bf1dcd26f359177915d536ca9107212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-576 |
| filingDate |
2014-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec623b8a0882e29ed4b1047f3c105e91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8886dc4c1e43c0e3c54f11d31849e65a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a03b8290278e1fc68ada5334d61bf61 |
| publicationDate |
2015-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015151347-A |
| titleOfInvention |
Photoacid generator and resin composition for photolithography |
| abstract |
Disclosed is a nonionic photoacid generator having high photosensitivity to i-line, excellent heat stability, high compatibility with hydrophobic materials, and excellent solubility in resist solvents. The present invention is a nonionic photoacid generator (A) represented by the following formula (1). [Chemical 1] [In Formula (1), R1 and R2 are C1-C18 hydrocarbon groups which may have a substituent (a part or all of hydrogen may be substituted with fluorine). R1 and R2 may be the same or different. Y represents a group represented by the formula (2). ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018105957-A |
| priorityDate |
2014-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |