| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0655 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D201-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-685
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-36 |
| filingDate |
2015-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e63a38b83b7e62e74b7982d27f2b9d51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9fbb3868b832970980028799f9e6ec2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a7a05658647669e8a5cead067a116f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b90ed5673cb18ca2843cf8f1dd8af1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e967c981e5adc9af89897347f1e8cde3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5afb3943e6181c981c8f1a632d217f9 |
| publicationDate |
2015-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015134926-A |
| titleOfInvention |
Coating composition for use with overcoated photoresist |
| abstract |
Kind Code: A1 A coating composition is provided as a base for a top-coated photoresist useful for reducing the resolution reduction of a patterned image due to reflection of activating radiation used to expose the photoresist. An undercoating composition comprising a resin containing a cyanurate group and a hydrophobic group derived from a compound represented by formula (I). The coating composition is an undercoating composition that can improve the resolution of an overcoated photoresist relief image. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021172296-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021172295-A1 |
| priorityDate |
2009-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |