| abstract |
The present invention relates to a polishing composition for a magnetic disk substrate capable of reducing scratches on the surface of the substrate after polishing, a method for producing a magnetic disk substrate using the same, and a method for polishing a substrate to be polished for a magnetic disk substrate. provide. A polishing composition for a magnetic disk substrate of the present invention contains silica particles, an aniline compound having a substituent, and an acid, and has a pH of less than 3. The aniline compound is composed of halogen, amino A group and at least one substituent selected from a cyano group, and an alkyl group as a substituent. [Selection figure] None |