http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015126032-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0f705f295f4ba571f5311e5ef1b57807 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-11 |
filingDate | 2013-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a03d15d60fdee7d2ab1dac5b18d57489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_255185ef6b4c5c5301c8cc58c1dbd8cb |
publicationDate | 2015-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2015126032-A |
titleOfInvention | Wiring board |
abstract | Provided is a wiring board having a filled via which is difficult to form an insulating film such as an oxide film or a sulfide film on the surface and is not easily deteriorated even when exposed to outside air. A wiring board includes at least a first conductor layer and a second conductor layer, and each of the first conductor layer and the second conductor layer includes an insulating layer. The method for forming the filled via 8 of the wiring substrate 1 includes a drilling step S1 for forming the through hole 5, a paste step S2 for filling the through hole 5 with the paste 6, and a drying step S3 for heating the wiring substrate 1 and drying the paste 6. The impregnation step S4 for infiltrating the through-hole 5 with the organometallic complex solution 7 and the heating step S5 for heating the wiring substrate 1 to reduce the organometallic complex solution 7 are provided. By this manufacturing process, the wiring substrate 1 on which the filled via 8 having high conductivity, heat dissipation, and connection reliability is formed can be obtained. [Selection] Figure 1 |
priorityDate | 2013-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.