| abstract |
An acid amplifier system is provided that can be used in photolithography, in particular for use in extreme UV (13.5 nm) or electron beam lithography. A sulfonic acid precursor compound represented by formula I or II, a photoresist composition for acid amplification comprising the compound and a photolithographic polymer, a photoresist substrate using the photoresist composition, and a method for producing the same A method of performing photolithography. [Selection figure] None |