http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015108644-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91453b34fcb5e6a976e3b6d59306e6a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0666762a4e064aeb8f5dd1b8869f7622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7433467e8d92a7efed47c889673c3c53 |
| publicationDate | 2015-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015108644-A |
| titleOfInvention | Composition for forming resist upper layer film for lithography |
| abstract | PROBLEM TO BE SOLVED: To provide a semiconductor device capable of selectively transmitting only EUV by blocking exposure light, for example, UV or DUV, which is not preferable in EUV exposure without intermixing with a resist, and developing with a developer after exposure. A resist upper layer film forming composition for use in a lithography process in a manufacturing process is provided. One or more compounds selected from (a) a tetracarboxylic dianhydride compound, (b) an acid dihalide compound, and (c) a compound having both a dicarboxylic anhydride group and an acid halide group, (D) A resist upper layer film-forming composition containing a resin containing at least one of an amide bond and an imide bond, which is produced by reacting with a diamine compound, and an alcohol solvent. The terminal of the resin may be sealed with an aromatic ring or an organic group containing an alkyl group having 1 to 5 carbon atoms. [Chemical 1] [Selection figure] None |
| priorityDate | 2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 420.