abstract |
A salt capable of producing a resist pattern having good line edge roughness (LER) is provided. A salt represented by formula (I). [In Formula (I), Q < 1 > and Q < 2 > represent a fluorine atom or a C1-C6 perfluoroalkyl group each independently. L b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms. R 1 represents an alkanediyl group having 1 to 12 carbon atoms. R 2 represents a hydrogen atom or an acid labile group. W represents an aliphatic ring having 3 to 36 carbon atoms, and the methylene group constituting the aliphatic ring may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, and is included in the aliphatic ring. The hydrogen atom to be substituted may be substituted with a hydroxy group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms. m represents 0 or 1. Z + represents an organic counter ion. ] [Selection figure] None |