http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015084046-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94cedf82f9dd732182f85b85735c22f0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f92eca2784174f96a1194f1aedb66c8f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e1e95573cdbb69e17880f0542427b6 |
publicationDate | 2015-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2015084046-A |
titleOfInvention | Resist pattern forming method and resist composition |
abstract | To improve resolution and process margin when forming a resist pattern. A resist composition containing a high molecular compound having a structural unit represented by general formula (a0-1) and patterned by negative development using a developer containing an organic solvent, to form a resist pattern How to form. In general formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Va 0 is a divalent hydrocarbon group which may have an ether bond, a urethane bond or an amide bond. n a0 is an integer of 0-2. R 1 is a chain or cyclic aliphatic hydrocarbon group. R 2 is a group that forms a monocyclic group together with the carbon atom to which R 1 is bonded. R 3 is a cyclic group which may have a substituent. [Chemical 1] [Selection figure] None |
priorityDate | 2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 318.