abstract |
A resin composition excellent in LWR, CDU, resolution, rectangularity, depth of focus, exposure margin, and MEEF is provided. A resin composition for use in forming a resist pattern, comprising a first structural unit having one or two COO groups, one OH group, a fluorine atom or a fluorinated alkyl group in a resin side chain. A resin composition comprising a first polymer having an organic solvent. [Selection figure] None |