| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-33 |
| filingDate |
2014-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de4a6d60991645fc02a94e6fb1745f68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef54f652079a5183c8979a0d894cbeba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2623587b0399e5c66ab3f9b6e44162a3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e46ce61488c7486e4f70a8bc8a29263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fb6880c44b0c2d43590b28e0359e048 |
| publicationDate |
2015-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015042751-A |
| titleOfInvention |
Novel antioxidants for post-CMP cleaning formulations |
| abstract |
The microelectronics industry seeks to improve cleaning formulations for copper metallized substrates and to make microelectronics such as compositions that exhibit a variety of usefulness for post-etch cleaning, post-ashing cleaning, and post-chemical mechanical polishing cleaning of microelectronic device wafers. We continue to improve the device structure processing composition. A cleaning composition and method for cleaning a residue and contaminant from a microelectronic device having the residue and contaminant thereon after chemical mechanical polishing (CMP). This cleaning composition contains a novel corrosion inhibitor. This composition very effectively cleans post-CMP residues and contaminants from the surface of the microelectronic device without damaging the low-k dielectric material or the copper interconnect material. [Selection figure] None |
| priorityDate |
2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |