http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015027993-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-02 |
| filingDate | 2014-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0106502b1821cd02a499d92f680621ab |
| publicationDate | 2015-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015027993-A |
| titleOfInvention | Salt, resist composition and method for producing resist pattern |
| abstract | A salt for an acid generator used in a resist composition capable of producing a resist pattern having excellent line edge roughness (LER) is provided. A salt represented by the formula (I0). [In Formula (I0), R 1 represents an acid labile group. R 3 and R 4 each independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. m and n each independently represents 1 or 2. When m is 2, two R 3 are the same or different, and when n is 2, two R 4 are the same or different. Ar represents an aromatic hydrocarbon group which may have a substituent or a heteroaromatic hydrocarbon group which may have a substituent. A − represents an organic anion. ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015027992-A |
| priorityDate | 2013-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 236.