http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015018940-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f56b5174f7d196258707ccf1d609796e
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
filingDate 2013-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0094da32cd0e644233cf1b9942568d03
publicationDate 2015-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2015018940-A
titleOfInvention Semiconductor device
abstract Parasitic capacitance generated between bit lines is reduced and adjacent contacts are prevented from being short-circuited through an air gap. A capacitor is formed in an upper layer than a bit line BT. A capacitor contact CCON2 that connects the capacitor and the substrate is located between adjacent bit lines BT. The adjacent bit lines BT have a first part PT1 that sandwiches the capacitor contact CCON2 between them, and a second part PT2 that does not sandwich the capacitor contact CCON2 between them. An air gap GT is formed in the insulating layer positioned between the second portions PT2, and an air gap GP is formed in a portion of the insulating layer positioned between the first portions PT1 that overlaps the capacitor contact CCON2. Not. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022075278-A1
priorityDate 2013-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17979268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453263778
http://rdf.ncbi.nlm.nih.gov/pubchem/protein/ACCQ00630

Total number of triples: 16.