http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015018072-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2013-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a13a8057c816466672a1370dfdbb32f6 |
| publicationDate | 2015-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015018072-A |
| titleOfInvention | Positive resist material and pattern forming method using the same |
| abstract | The weight average molecular weight is 1 including a repeating unit in which a hydrogen atom of a carboxyl group and / or a phenolic hydroxyl group is substituted with an acid labile group, and a repeating unit having a group represented by the general formula (1). A positive resist material comprising a high molecular compound in the range of 1,000 to 500,000 as a base resin. (R 1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and one of X and Y is a nitrogen atom and the other is a carbon atom. M is 0 or 1.) [Effect] The positive resist material of the present invention is highly effective in suppressing acid diffusion, has high resolution, and has a good pattern shape and edge roughness after exposure. Accordingly, it is possible to obtain a positive resist material, particularly a chemically amplified positive resist material suitable as a fine pattern forming material for photomasks for VLSI manufacturing or EB drawing, and as a pattern forming material for EB or EUV exposure. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021157354-A1 |
| priorityDate | 2013-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 334.