http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015011169-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2013-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91453b34fcb5e6a976e3b6d59306e6a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 |
| publicationDate | 2015-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015011169-A |
| titleOfInvention | Composition for forming resist upper layer film for lithography and method for manufacturing semiconductor device using the same |
| abstract | PROBLEM TO BE SOLVED: To provide a semiconductor device capable of selectively transmitting only EUV by blocking exposure light, for example, UV or DUV, which is not preferable in EUV exposure without intermixing with a resist, and developing with a developer after exposure. Provided is a resist upper layer film forming composition used in a lithography process in a manufacturing process. SOLUTION: A novolak polymer containing a saturated linear or branched alkyl group having 4 to 20 carbon atoms or a saturated linear or branched alkoxy group having 4 to 20 carbon atoms, and the number of carbon atoms optionally substituted as a solvent A composition for forming a resist upper layer film comprising 8 to 16 ether compounds, wherein the novolak polymer contains 35 mol% or more of a unit structure containing the alkyl group or the alkoxy group in the entire unit structure. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170127489-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102552910-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10042258-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10353290-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016013598-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016136596-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107531597-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016136596-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3266759-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7331853-B2 |
| priorityDate | 2013-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 645.