| abstract |
A process is provided for contacting the nanostructured surface. In this process, a substrate having a nanostructured material on the surface is provided. The substrate is conductive and the nanostructured material is coated with an insulating material. A portion of the nanostructured material is at least partially removed. A conductor is deposited on the substrate in the following manner, i.e., in such a manner that the conductor is in electrical contact with the substrate in all areas where the nanostructured material has been at least partially removed. |