| abstract |
Compositions and methods for controlled polymerization and / or oligomerization of silane (and optionally cyclosilane) compounds, including those of the general formulas Si n H 2n and Si n H 2n + 2 , and halosilanes and arylsilanes, comprising: Produces soluble polysilanes, polygermanes, and / or polysilagermanes having levels of carbon and metal contamination, high molecular weight, low volatility, high purity, high solubility, and / or high viscosity. Polysilane, polygermane, and / or polysilagermane are useful precursors for conductive films, semiconductor films, and dielectric films containing silicon and / or germanium. [Selection] Figure 3 |