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filingDate 2012-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014525384-A
titleOfInvention Silicon nitride-containing release layer with excellent hardness
abstract The present invention includes a substrate having a release layer to adhere firmly, the release layer, 92 to 98% by weight of silicon nitride (Si 3 N 4) and 2-8% by weight of silicon dioxide (SiO 2) And having a total oxygen content of ≦ 8% by weight and a hardness of at least 10 HB 2.5 / 3 according to DIN EN ISO 6506-1. The invention further relates to a method for making such shaped articles, a coating suspension for use in such a method, and the use of the shaped articles according to the invention in the field of corrosive non-ferrous metal melts. . [Selection figure] None
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