| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2303-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2305-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-3227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-328 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-722
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-20 |
| filingDate |
2012-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014508033-A |
| titleOfInvention |
Method and system for providing ultrapure water |
| abstract |
Methods and systems are provided for providing ultra pure water for semiconductor manufacturing operations. Water is treated by utilizing free radical scavenging and free radical removal systems. Free radical scavenging systems can utilize actinic radiation with free radical precursor compounds such as ammonium persulfate. The free radical removal system can include the use of a reducing agent. Ultrapure water may be further processed by utilizing an ion exchange medium and a degasser. The control system can be utilized to regulate the addition of precursor compounds, the intensity of actinic radiation and the addition of reducing agents to water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10961143-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11697607-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016064342-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021058845-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018518352-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021070573-A1 |
| priorityDate |
2011-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |