http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014505124-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2011-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014505124-A |
| titleOfInvention | Aqueous polishing composition and method for chemically and mechanically polishing a substrate containing a silicon oxide dielectric film and a polysilicon film |
| abstract | An aqueous polishing composition comprising: (A) abrasive ceria particles, and (B) general formula I: R [(B1) m / (B2) n Y] p (I), (Wherein the indices and variables have the following meanings: m, n, and p are integers ≧ 1; R is a monovalent or polyvalent organic residue excluding a hydrogen atom or a C 5 -C 20 alkyl group; (B1) is a block of oxyethylene monomer units, (B2) is a block of substituted oxyalkylene monomer units, wherein the substituent is two methyl groups, an alkyl group having more than two carbon atoms, and cycloalkyl, aryl, alkyl-cycloalkyl, alkyl-aryl. cycloalkyl - aryl and alkyl - cycloalkyl - a block which is selected from aryl, and Y is a monovalent organic residue except hydrogen atom or a C 5 -C 20 alkyl group, However, if (B) contains more than one block (B1) or (B2), it is assumed that two blocks of the same type are separated from each other by other types of blocks) Aqueous polishing composition comprising an amphiphilic nonionic surfactant selected from the group consisting of water- and water-dispersible linear and branched polyoxyalkylene block copolymers. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015227446-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018504770-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015231029-A |
| priorityDate | 2010-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 210.