http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014232310-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 2014-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_898802992cbabd9455d2e28e949dee45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36112d936f95a4f738e5a430ea5215aa |
publicationDate | 2014-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2014232310-A |
titleOfInvention | Pattern forming method, electronic device and manufacturing method thereof |
abstract | An object of the present invention is to provide a pattern forming method that can be suitably applied to the formation of fine line and space patterns and hole patterns, and in which film slippage is suppressed. A step (1) of forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin having a group that generates a polar group by being decomposed by the action of an acid; A step (2) of exposing the film, and a step (3) of developing the exposed film to form a pattern, wherein the step (3) includes a step A with a developer containing water, and an organic solvent. One of the steps B in the developer B containing the developer is performed, and then the other step is performed. In the developer containing the organic solvent, an ionic bond, a hydrogen bond, a chemical bond, and a dipole The pattern formation method including the additive which forms at least 1 interaction of interaction with a polar group. [Selection figure] None |
priorityDate | 2013-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 456.