| abstract |
A photosensitive resin composition having an excellent balance between chemical resistance and other characteristics required for a photosensitive resin composition, and an electronic device having the photosensitive resin composition are provided. A polymer (first polymer) represented by the following formula (1), a first cross-linking agent that cross-links with the polymer, and a reactive group that cross-links with the polymer or the first cross-linking agent. An acrylic resin as a second cross-linking agent and a photosensitive agent are included. (In formula (1), R 1, R 2, R 3 and R 4 are each independently hydrogen or an organic group having 1 to 30 carbon atoms, and A is a maleic anhydride derivative structural unit.) |