http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014220454-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2755c806997dfe83a65d0368c30fda8f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2102ae92d209c2f12af9cc2e6c61b2f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2013-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f289d8313171e3c703bec4fd5384ec27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc33a2ef987dbf2aa448d98ec6e8cc6a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ece4df8c593aa1af6cf36ebeee1c484c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e29cff61acdeee1703861e34f4ab3ec7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_152d744e1115729339f19b180c15b19b |
| publicationDate | 2014-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014220454-A |
| titleOfInvention | Resist material for imprint and method for producing fine structure using the same |
| abstract | An imprint resist material that can relax imprint conditions and is excellent in mold pattern transfer accuracy, and a method for manufacturing a fine structure using the resist material. An imprint resist material comprising an ultraviolet curable side chain crystalline polymer. The step of laminating the coating 1 made of this imprint resist material on the surface 21 of the substrate 2, and the coating 1 is molded in the mold 3 in a state where the temperature of the coating 1 is set to a temperature equal to or higher than the melting point of the ultraviolet curable side chain crystalline polymer. The mold 3 is coated with the coating 1 in a state where the coating 1 is irradiated with ultraviolet rays to cure the coating 1 with ultraviolet rays, and the temperature of the coating 1 is set to a temperature lower than the melting point of the ultraviolet curable side chain crystalline polymer. And a step of transferring the fine pattern 31 of the mold 3 to the coating 1 by peeling off from the film. [Selection] Figure 1 |
| priorityDate | 2013-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.