http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014218570-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 |
| filingDate | 2013-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99acb4b074094251f50ea6452c55f441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17de1b2a5e8ea66f9432e3137d1177d1 |
| publicationDate | 2014-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014218570-A |
| titleOfInvention | Method for producing polymer for semiconductor lithography |
| abstract | Disclosed is a method for stably producing a polymer (resist) for semiconductor lithography by dissolving a solid monomer raw material in another raw material and supplying it as a solution. A method for producing a polymer for semiconductor lithography, comprising the following steps (1) and (2). (1) A step of supplying a polymerization raw material in which a monomer (A) having a melting point of 5 ° C. or higher is dissolved in a polymerization solvent and / or another monomer (B) to a preparation kettle; (2) the polymerization raw material The step of supplying the polymer from the blender to the polymerization kettle and polymerizing it. The method for producing a polymer for semiconductor lithography, wherein the step (2) is dropping polymerization, and the melting point of the monomer (A) is 10 ° C. or higher. [Selection figure] None |
| priorityDate | 2013-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 85.