Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
filingDate |
2014-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_587775c2e54656b916ab8a22c9214dee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1facff11c74801421334a59851ec009b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_424dbfcbafed8efc707b021e4a23ab93 |
publicationDate |
2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2014209264-A |
titleOfInvention |
Insulating pattern forming material for damascene process |
abstract |
An insulating pattern forming method and a resin composition capable of easily forming a multilayer structure without performing a complicated etching process or the like. [I] a step of forming an organic pattern on a substrate; [II] a step of embedding an insulating material between patterns of the organic pattern; and [III] a step of removing the organic pattern and comprising the insulating material. An insulating pattern forming method and a damascene process insulating pattern forming material, comprising: a step of obtaining a reverse pattern; and [IV] a step of curing the obtained reverse pattern. [Selection] Figure 1 |
priorityDate |
2014-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |