http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014191176-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ac9431af38c2b001e21476e84724c5c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0a9948f5b3db1da5289cc4391b407bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d52cb64acbbdb1ec4e6c5a866cfa981 |
| publicationDate | 2014-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014191176-A |
| titleOfInvention | Photomask blanks, photomask and method for manufacturing the same |
| abstract | An object of the present invention is to reduce the influence of an electromagnetic field (EMF) effect to reduce the value of an EMF bias, to have a high light shielding property against exposure light even when the light shielding layer is thin, and to have excellent pattern processability. Provided are a binary-type photomask blank suitable for a lithography technique with a half pitch of 40 nm or more on a wafer, a photomask, and a manufacturing method thereof. A photomask blank used for ArF excimer laser exposure light and having a light shielding film for forming a mask pattern on a transparent substrate, wherein the light shielding film is reflected on a single light shielding layer or on a light shielding layer. It has a two-layer structure provided with a prevention layer, has an optical density with respect to exposure light of 2.8 or more, a film thickness of 50 nm or less, and is composed of a single metal material film that does not contain a transition metal. Features. [Selection] Figure 5 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I811189-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102374972-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170102811-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3214496-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11327393-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10678125-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102587661-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110603489-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017161889-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015092281-A |
| priorityDate | 2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.