http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014188647-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-22
filingDate 2013-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5792e706bfc3b703ea21e1c33d7fc384
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publicationDate 2014-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014188647-A
titleOfInvention Polishing pad
abstract An object of the present invention is to achieve stable polishing characteristics over a long period of time by suppressing changes in polishing characteristics over time due to water absorption while simultaneously suppressing scratches generated on the surface of the workpiece, high planarization characteristics, and good in-plane uniformity. Provided polishing pad. A polishing pad comprising a polishing layer formed from a plurality of sheets, comprising: The polishing layer has at least a first sheet having a polishing surface that comes into contact with an object to be polished, and a second sheet laminated on a surface opposite to the polishing surface of the first sheet, A polyethylene terephthalate film having a thickness of 10 μm or more and 125 μm or less is bonded with an adhesive between the first sheet and the second sheet, The values of the type D durometer hardness (D1) of the first sheet and the type D durometer hardness (D2) of the second sheet are 30 or more and 60 or less, and D1 <D2. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015178289-A1
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type http://data.epo.org/linked-data/def/patent/Publication

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