Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
filingDate |
2013-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcf4340e8e1ff85fa9d0b70f31ac4cc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50f4a97d049df833ff4c1ad182ea4d9a |
publicationDate |
2014-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2014182201-A |
titleOfInvention |
Resist composition and pattern forming method |
abstract |
An insulating film having a low dielectric constant is efficiently formed at low cost. A resist composition 10 contains, in a solvent 12, a resin 11 obtained by hydrolysis and condensation of an alkoxy group-containing compound having an alkoxy group bonded to a silicon atom or a germanium atom in the presence of an acid or an alkali. Including. In the resist composition 10, the irradiated portion of the energy beam becomes insoluble in the developer. For example, an insulating film pattern is formed by providing the resist composition 10 on a substrate, irradiating a part of the resist composition 10 with energy rays, and removing an unirradiated portion with a developer. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019111665-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11079676-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018123388-A1 |
priorityDate |
2013-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |