abstract |
A resist composition capable of producing a resist pattern having an excellent shape and resolution is provided. A resist composition containing a resin (A1), a resin (A2), a resin (A3) and an acid generator. Resin (A1): Resin containing a (meth) acrylic specific structural unit having a dissociable group, Resin (A2): Resin containing a styrene specific structural unit having a dissociable group and a hydroxystyrene structural unit, Resin (A3): A resin containing a structural unit represented by formula (a5-1). [In the formula (a5-1), Ra50 represents a hydrogen atom or a methyl group. Ra51 represents a saturated hydrocarbon group having 1 to 18 carbon atoms. ] [Selection figure] None |