http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014153522-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B9-10
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filingDate 2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d2fb615001cf96f01992ee8bac9b50e
publicationDate 2014-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014153522-A
titleOfInvention Light-shielding film and method for manufacturing the same, and diaphragm, shutter blade, and light quantity adjusting diaphragm blade using the same
abstract [PROBLEMS] To be used as an optical device part such as a lens shutter of a mobile phone with a camera, a digital camera, a digital video camera, a shutter blade or a diaphragm blade, or a diaphragm blade for adjusting a light amount of a projector. Provided are a light shielding film excellent in slidability, conductivity, heat resistance, high temperature resistance and high humidity, and a method for producing the same. A resin film substrate (A) having a surface roughness of arithmetic average height Ra of 0.2 to 2.2 μm, and a film thickness is formed by sputtering on one or both surfaces of the resin film substrate (A). A light shielding material in which a Ni-based metal film (B) having a thickness of 50 to 250 nm is formed, and a crystalline Ni-based metal oxide film (C) having a thickness of 100 to 400 nm is formed on the Ni-based metal film (B). The oxygen content of the Ni-based metal film (B) is 0.20 or less in terms of the O / Ni atomic ratio, and the oxygen content of the Ni-based metal film (B) is 0 in terms of the O / Ni atomic ratio. The minimum optical density at a wavelength of 380 to 780 nm is 4 or more, and the maximum regular reflectance is 0.4% or less. [Selection] Figure 1
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