http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014118468-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2012-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf999fc560beea3dcc30c788434525bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_894a63295dbfec06e1dc36e6a2f09360 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f821a9dd707cabbecab20100e20f164 |
publicationDate | 2014-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2014118468-A |
titleOfInvention | Abrasive grains and method for producing the same, polishing slurry and method for producing glass substrate |
abstract | Cerium oxide is difficult to supply stably, and in recent years, prices have risen. For this reason, studies have been conducted on abrasives that can replace cerium oxide abrasive grains. There has been a problem of providing polishing abrasive grains and polishing slurry that can polish an object to be polished at a high polishing rate without using cerium oxide abrasive grains and that can be easily cleaned after polishing. The present invention provides a abrasive for polishing a substrate, the abrasive grains consist mainly Mn 2 O 3 particles, the Mn 2 O 3 particles, oxidation-reduction potential than Mn 2 O 3 A polishing abrasive grain characterized by having an organic substance which becomes negative is supported. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016158328-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016158328-A1 |
priorityDate | 2012-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.