| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0578340d8eda8655050b54e7ae628333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04d3730b6ad527289e0c18d5b14850d2 |
| publicationDate |
2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014115633-A |
| titleOfInvention |
Resist composition and method for producing resist pattern |
| abstract |
An object of the present invention is to provide a resist composition capable of producing a resist pattern with excellent pattern collapse resistance (PCM). A resin having a structural unit represented by the formula (I) and a structural unit represented by the formula (a4) and having no acid labile group, a structure represented by the formula (II) A resist composition containing a resin having a unit and a structural unit having an acid labile group, and an acid generator. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9519218-B2 |
| priorityDate |
2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |