http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014098104-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26f787ebd46623d19884567098dc66d0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_837bc776458914619fcbe3b3e0f30024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d61604449b39950320d3a048e46604cc |
| publicationDate | 2014-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014098104-A |
| titleOfInvention | NOVOLAC TYPE PHENOL RESIN, METHOD FOR PRODUCING NOVOLAC TYPE PHENOL RESIN, AND PHOTORESIST COMPOSITION |
| abstract | [PROBLEMS] To provide a novolac type phenolic resin, a method for producing a novolac type phenolic resin, and a photoresist composition that enable the production of a photoresist composition having a good balance of high resolution, high sensitivity, high residual film ratio, and high heat resistance. I will provide a. A novolac type phenol resin obtained by condensation polymerization reaction of a phenol component (a) and an aldehyde component (b), wherein the phenol component (a) contains m-cresol and / or p-cresol. A novolak-type phenolic resin, a method for producing the same, and a photoresist composition comprising the same, wherein the aldehyde component (b) is mainly composed of alkoxybenzaldehydes (b1) and formaldehyde (b2). It is. [Selection figure] None |
| priorityDate | 2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 122.