| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fa80eed27901ac84139c7a7109c21e17 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02447
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02579
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02502
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02378
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02576 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 |
| filingDate |
2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5ad9f841ec66d4038ebbf04ba584a42 |
| publicationDate |
2014-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014093525-A |
| titleOfInvention |
Epitaxial wafer |
| abstract |
An object of the present invention is to provide an epitaxial wafer having improved characteristics and yield with reduced surface defect density. An epitaxial wafer of the present invention includes a substrate and an epitaxial structure disposed on the substrate, and the epitaxial structure includes a first epitaxial layer and a second epitaxial layer disposed on the first epitaxial layer. An epitaxial layer, disposed between the first epitaxial layer and the second epitaxial layer, having a first doping concentration at a first boundary adjacent to the first epitaxial layer, and at a second boundary adjacent to the second epitaxial layer And a third epitaxial layer having a second doping concentration different from the first doping concentration. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018006384-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019224953-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018131449-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018113303-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019224953-A1 |
| priorityDate |
2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |