| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb022d6b6937718c5a71f2bc17b01ae3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d78fe473c8a29219129bbc8bb50f6a59 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4581 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2012-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78a665e49e16f458f688da7406d1fc24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_157e1eb9c42d425c329886cbcf924159
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f7f4ac8609d0f2af76bd7ed5007120c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a1e26be24f00a9620d2ed52c5186553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a19a1e84c7f076e64c8a9400b7af74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_996846f51d545bb74a0a60ebca9ba2a5 |
| publicationDate |
2014-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014072477-A |
| titleOfInvention |
Wafer support of semiconductor epitaxial manufacturing apparatus, manufacturing method thereof, semiconductor epitaxial manufacturing apparatus, and manufacturing method thereof |
| abstract |
An object of the present invention is to provide a wafer support capable of suppressing the generation of crystal defects and particles of a semiconductor epitaxial wafer to be manufactured even when used for a long time in a semiconductor epitaxial manufacturing apparatus. In a semiconductor epitaxial manufacturing apparatus, a wafer support for floating a satellite on which the semiconductor substrate is mounted with a gas, and a protective layer over the entire surface of a gas passage formed in the wafer support through which the gas for floating the satellite passes Or a wafer support of a semiconductor epitaxial manufacturing apparatus having a protective tube. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947640-B1 |
| priorityDate |
2012-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |