http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014070244-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7e48c5eb682ba2264ba292e55ae3ee22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9edf73631bcd839db3016d03a7bc173b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_552fe95e61f8e460cb9392da0ce07866 |
| publicationDate | 2014-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014070244-A |
| titleOfInvention | Plasma CVD equipment |
| abstract | Provided is a plasma CVD apparatus capable of forming a plasma CVD layer on a substrate surface with a uniform thickness while advantageously suppressing the adhesion of the plasma CVD layer to other than the substrate surface. A plurality of jet holes communicating with a blow-out port for blowing out plasma from a plasma generating section and diffusing and blowing the plasma blown out from the blow-out port into a reaction chamber in which a substrate is accommodated. A shower head 62 provided with 112 was arranged in the reaction chamber 22 and constituted. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019145990-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016039356-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11412606-B2 |
| priorityDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.