http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014060288-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-343
filingDate 2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4dc0303573415def4136b003c8172e5b
publicationDate 2014-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014060288-A
titleOfInvention Semiconductor device and manufacturing method thereof
abstract The reliability of a semiconductor device is improved. A feature of the first embodiment is that, for example, a p-type cladding layer PCL includes a p-type cladding layer PCL1, a p-type cladding layer PCL2, and a p-type cladding layer PCL3. . At this time, the band gap size (Eg1) of the p-type cladding layer PCL1 is smaller than the band gap size (Eg2) of the p-type cladding layer PCL2. Further, the band gap size (Eg3) of the p-type cladding layer PCL3 is larger than the band gap size (Eg1) of the p-type cladding layer PCL1 and the band gap size of the p-type cladding layer PCL2 ( It is smaller than Eg2). [Selection] Figure 2
priorityDate 2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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