http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014050805-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c38d38e537a924288998414661dd926a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-10 |
filingDate | 2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42766e081baa706c84385d6776f44644 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_558e2a5106b64aae75c857624872d9ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9587daccdb4ff4aa70f3a3eeaca9a580 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5d37fc90af06fee0bf0433d252e6a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86a231b3deca6a3c6b834808398bb78a |
publicationDate | 2014-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2014050805-A |
titleOfInvention | Method for forming silicon film |
abstract | A method for forming a high-quality silicon film inexpensively and easily while utilizing the advantages of silicon film formation by a coating method. The present invention is a method for forming a silicon film, characterized in that at least the following two steps are performed in an arbitrary order; a coating film-forming composition containing a silane compound is applied on a substrate. Forming a coating film, and then subjecting the coating film to at least one treatment selected from the group consisting of heat treatment and light treatment, and a gas generated by heating the silane compound under normal pressure A normal pressure CVD process in which the substrate is brought into contact with a heated substrate. [Selection figure] None |
priorityDate | 2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.