http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014048102-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f56b5174f7d196258707ccf1d609796e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 |
| filingDate | 2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_999a77bed9f7570c8f16335fc0ed7608 |
| publicationDate | 2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014048102-A |
| titleOfInvention | Semiconductor device manufacturing method and semiconductor device manufacturing system |
| abstract | A semiconductor device manufacturing method capable of cleaning a contact terminal of an inspection apparatus at an appropriate timing. In a method for manufacturing a semiconductor device, for each of a plurality of types of inspection items, threshold values of defect rates that are criteria for performing cleaning of contact terminals of an inspection device (for example, a tester TS1) are set to different values. deep. When the defect rate due to any one or more inspections is equal to or higher than a threshold corresponding to the inspection, it is determined that the contact terminal of the inspection apparatus needs to be cleaned. [Selection] Figure 4 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6443953-B1 |
| priorityDate | 2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17979268 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453263778 http://rdf.ncbi.nlm.nih.gov/pubchem/protein/ACCQ8WTV0 |
Total number of triples: 14.