| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G2215-0054
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49544 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B25-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G15-0806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G15-0818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B25-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G15-08 |
| filingDate |
2013-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_418887b3ce575105055ac47ea5e148ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3179202c89b3fe57714a4c0a216f46e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b395ad2250766eb7027f3d2919ec55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_859ab1e3a4236a06bc687b2fb31836da |
| publicationDate |
2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014029499-A |
| titleOfInvention |
Developing member, process cartridge, and electrophotographic apparatus |
| abstract |
Provided is a high-quality developing member that is excellent in deformation recovery at high temperatures and also has filming resistance at low temperatures. A developing member of the present invention includes a shaft core body, an elastic layer formed on an outer peripheral surface of the shaft core body, and a surface layer covering the outer peripheral surface of the elastic layer. The surface layer contains a first resin and a second resin, and the first resin has a specific structure between two adjacent urethane bonds, and the second resin has a specific structure. And a glass transition point Tg of 20 ° C. or higher and 120 ° C. or lower. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016012130-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9625854-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020086077-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7171385-B2 |
| priorityDate |
2012-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |