http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014029494-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3445 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02 |
filingDate | 2013-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_316dc9ef3e33bc1aace42938b037bf4a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670712e4c98df4c464bc1ac57747e207 |
publicationDate | 2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2014029494-A |
titleOfInvention | Resist composition and method for producing resist pattern |
abstract | A resist composition capable of producing a high-resolution resist pattern is provided. A resin containing a structural unit having an acid labile group, an acid generator represented by formula (I), a compound represented by formula (II1), and a compound represented by formula (II2) A resist composition containing at least one compound selected from the group consisting of: [Wherein, X 2 represents an alkanediyl group which may have a substituent, the methylene group constituting the group may be replaced with an oxygen atom or a carbonyl group, and R 4 may have a substituent. Hydrocarbon group, methylene group constituting the group may be replaced by an oxygen atom or a carbonyl group, Z + is an organic cation, R II6 is an alkyl group, an alicyclic hydrocarbon group, etc., X II1 is a single bond or alkanediyl group, X II2 represents an oxygen atom or -N (R d) -, X II3 is alkanediyl group, R d represents a hydrogen atom or an alkyl group, R II3, R II4 and R II5 are each a hydrogen atom Represents an alkyl group or the like. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016027546-A1 |
priorityDate | 2012-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 232.