| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30608 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2012-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7bf759f761d462f01b02dd581eddec9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9ae473615132f17d2d1a46ddb424cfd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12a8dc53697a9aa533b75f401ecb5452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9cc9ccffa31b8a092f6edd7dcb7a989 |
| publicationDate |
2014-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014022657-A |
| titleOfInvention |
Etching method, semiconductor substrate product and semiconductor element manufacturing method using the same, and etching solution preparation kit |
| abstract |
A method for etching a semiconductor substrate that eliminates a decrease in activity of the etching solution over time and enables good wet etching of a Ti-containing layer, a method for manufacturing a semiconductor substrate product and a semiconductor element using the same, and an etching solution A kit for preparation is provided. In etching a layer containing Ti by applying an etching solution having a pH of 8.5 to 14 to a Ti-containing layer of a semiconductor substrate, the first solution containing a basic compound and an oxidizing agent are contained. A method for etching a semiconductor substrate, comprising: mixing an etching solution by mixing the second solution, and applying the etching solution to the semiconductor substrate at an appropriate time after the mixing. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114989825-A |
| priorityDate |
2012-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |